The global atomic layer deposition Market was valued at US$ 2.03 Bn in 2023, exhibiting a CAGR of 13.1% in terms of revenue, over the forecast period (2023 to 2030) to reach US$ 4.81 Bn by 2030.
Atomic layer deposition (ALD) is a thin film coating technique that deposits a film one atomic layer at a time on a component or system in a controlled manner. Traditional thin film technologies such as chemical vapor deposition (CVD), spin coating, and physical vapor deposition (PVD) cannot function in nanometer-scale deposits; this process has been used in the semiconductor industry.
Covid-19 Impact on Global Atomic Layer Deposition Market
The global economy has been affected by the coronavirus pandemic as governments across the globe imposed lockdown measures to curb people’s movement. Due to these lockdowns, industrial activities were halted, and international travel was halted. These measures had a significant took on almost all industrial sectors. Factories and manufacturing facilities also faced supply chain breakdowns and labor shortages. The COVID-19 pandemic continues to wreak havoc on the supply chain of the atomic layer deposition industry. Various countries and sub-regions such as the U.S., Germany, France, China, India, Japan, South Korea, Taiwan, and ASEAN are prominent markets in terms of both production and consumption of atomic layer deposition. These countries are heavily impacted by COVID-19. The pandemic has slowed the atomic layer deposition manufacturing projects due to labour shortages and disruptions in the supply of raw materials. Due to such interruptions to global trade, the projects under construction were delayed, resulting in higher capital expenditure (CAPEX), which in turn halted the supply of atomic layer deposition.
Global Atomic Layer Deposition Market - Drivers
Figure 1: Global Atomic Layer Deposition Market , By Product, 2023
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Global Atomic Layer Deposition Market - Restraints
Global Atomic Layer Deposition Market - Segmentation
Among product, theluminium oxide segment accounted for the highest market share of 33% in the global atomic layer deposition market in 2022. The use of atomic layer deposition to create aluminium oxide thin films aids in the encapsulation of organic light emitting devices, or OLEDs. The growing demand for OLEDs from the electronic industry has propelled the segment's growth.
Atomic Layer Deposition Market Report Coverage
Report Coverage | Details | ||
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Base Year: | 2022 | Market Size in 2023: | US$ 2.03 Bn |
Historical Data for: | 2018 to 2021 | Forecast Period: | 2023 to 2030 |
Forecast Period 2023 to 2030 CAGR: | 13.1% | 2030 Value Projection: | US$ 4.81 Bn |
Geographies covered: |
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Segments covered: |
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Companies covered: |
ALD Nano Solutions, Inc., Applied Materials, Inc., ASM International, Beneq, Denton Vacuum, Hitachi, Kurt J. Lesker Company, Lam Research Corporation, Tokyo Electron, and Wonik IPS |
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Growth Drivers: |
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Restraints & Challenges: |
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Global Atomic Layer Deposition Market - Opportunities
Figure 2: Global Atomic Layer Deposition Market , By Product, 2023
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Global Atomic Layer Deposition Market - Trends
The semiconductor and electronics industries are expected to drive demand
The semiconductor and electronics industries are expected to drive demand for atomic layer deposition technology. While the semiconductor industry is expected to have a direct impact on the technology's development, any increase in the electronics industry will help the technology advance. As a result, the atomic layer deposition market is expected to grow in the forecast period.
Global Atomic Layer Deposition Market - Regional Insights
Among regions, Asia Pacific held a dominant position in the global atomic layer deposition market in 2022, accounting for 67% market share in terms of revenue, followed by North America and Europe. Due to the increasing semiconductor and medical equipment industry
Global Atomic Layer Deposition Market - Key Developments
Global Atomic Layer Deposition Market - Key Players
Key players operating in the global atomic layer deposition market include ALD Nano Solutions, Inc., Applied Materials, Inc., ASM International, Beneq, Denton Vacuum, Hitachi, Kurt J. Lesker Company, Lam Research Corporation, Tokyo Electron, and Wonik IPS
*Definition: Atomic layer deposition (ALD) is a thin film coating technique that deposits a film one atomic layer at a time on a component or system in a controlled manner. Traditional thin film technologies such as chemical vapour deposition (CVD), spin coating, and physical vapour deposition (PVD) cannot function in nanometer-scale deposits; this process has been used in the semiconductor industry.
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About Author
Yash Doshi
Yash Doshi is a Senior Management Consultant. He has 12+ years of experience in conducting research and handling consulting projects across verticals in APAC, EMEA, and the Americas.
He brings strong acumen in helping chemical companies navigate complex challenges and identify growth opportunities. He has deep expertise across the chemicals value chain, including commodity, specialty and fine chemicals, plastics and polymers, and petrochemicals. Yash is a sought-after speaker at industry conferences and contributes to various publications on topics related commodity, specialty and fine chemicals, plastics and polymers, and petrochemicals.
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