Market Challenges And Opportunities

Advent of 3D finFETs, NAND and advanced DRAMs technologies are expected to present considerable growth challenge to the industry growth

Optical and E-beam are complementary technologies that perform distinct operations in the workflow. optical has fast throughputs and finds great applications in the end use. On the other hand E-beam helps in detection of smallest defects, however the throughputs are low. Owing to these features, it finds substantial applications in R&D activities. Increasing demands for advanced computing and processing has led to development of 3D finFETs, NAND and advanced DRAMs, which requires the tools to assess complex structures. Wafer assessment on the scales below 10 nm is extremely difficult, and in case of overlooking of the smallest error can impact the end use. This is expected to be major industry growth challenge over the next coming years.