EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET ANALYSIS

Key Developments

• In July 2023, Canon, a global leader in imaging and optical products, unveiled a new photomask technology specifically designed for Extreme Ultraviolet (EUV) lithography. This innovative technology aims to enhance the precision and efficiency of semiconductor manufacturing, enabling the production of smaller and more complex microchips. Canon's advancements in photomask technology are expected to play a crucial role in meeting the growing demands of the semiconductor industry, particularly as manufacturers strive for greater miniaturization and performance in their chips.
• In March 2023, TSMC (Taiwan Semiconductor Manufacturing Company), the world's largest dedicated independent semiconductor foundry, announced plans to expand its EUV (Extreme Ultraviolet) lithography capabilities at its manufacturing facilities. This expansion is part of TSMC's ongoing efforts to enhance its advanced chip production processes, allowing the company to meet the increasing demand for smaller, more powerful microchips. By investing in EUV technology, TSMC aims to maintain its competitive edge in the semiconductor industry and support the development of next-generation devices that require advanced manufacturing techniques.
• In December 2021, ASML, a Netherlands-based company and the world's leading provider of semiconductor manufacturing equipment, announced the release of a new version of its extreme ultraviolet (EUV) lithography systems. These cutting-edge machines are essential for etching intricate patterns onto silicon wafers, enabling the production of the most advanced CPUs. Major chipmakers like Samsung, TSMC, and Intel utilize ASML's existing EUV technology to develop the next generation of processors for PCs and smartphones. ASML's innovative EUV lithography systems are at the forefront of semiconductor manufacturing, driving the industry forward and supporting the development of increasingly powerful and energy-efficient electronic devices.
• In March 2021, Samsung, a major player in the global semiconductor industry, announced plans to increase production of its EUV (Extreme Ultraviolet) scanners, aiming to compete with TSMC, the world's largest foundry. Unlike traditional lithography machines, EUV scanners streamline the chip fabrication process by reducing the number of photolithography steps needed to create finer circuits. This technological advancement is driving competition among leading chipmakers as they strive to adopt EUV technology for improved manufacturing efficiency and capability.