COPPER SPUTTERING TARGET MARKET ANALYSIS

Market News

Global Copper Sputtering Target Market- Recent Developments

New Product Launches

• In January 2022, Testbourne Ltd is a materials company, supplying high purity materials, single crystals & wafers, launched a new range of high purity copper sputtering targets specifically for HAMR HDD production. The new targets provide the ultra-high purity and uniform grain structure required for high storage density HAMR media.
• In June 2021, Plasmaterials Inc. is providing high purity materials for all types of thin film applications, introduced the new extra-large Cu sputtering target with dimensions of 550 x 1250 mm to enable coating larger substrate sizes. The jumbo target is ideal for high volume production in PV and display applications.
• In May 2020, Kurt J Lesker Company is manufacturing of vacuum products, launched a new cylindrical rotatable magnetron copper target for uniform erosion and enhanced target utilization. The patented design enables 360-degree rotation for consistent film thickness and composition.

Acquisition and Partnerships

• In March 2022, Praxair announced a strategic supply agreement with Samsung Electronics to provide high-purity Cu sputtering targets for semiconductor manufacturing. This strengthened Praxair's position as a key supplier to Samsung's global operations.
• In October 2020, JX Nippon Mining partnered with AGC Inc., a automobile glass manufacturer, to develop a new type of transparent EMI shielding glass using a copper film deposited via sputtering technology. This enables wider application in electric and autonomous vehicles.